Latest news:
- Symposium on Challenges for Nano-scale Measurement in Materials Science and Manufacturing Technology
- Roadmap for Lithography: A combination of water immersion lithography at 193nm and double expsoure/double patterning will enable extension of optical lithography to the 32 nm and 23 nm nodes says Mordechai Rohschild in OPN Magazine June 2010
- Video interview: Tayyaba Hasan on developments in photodynamic therapy
- Federal Appeals Court Deals a Blow to Patenting Basic Research